A key
challenge in the processing is to integrate high quality, epitaxial
or biaxially textured and oriented ferroelectric materials with silicon,
which remains the preferred material for microfabrication and electronics.
The processing effort will focus on this challenge. In the initial phase,
highly textured thin films will be grown using Chemical Vapor Deposition
and sol-gel synthesis onto a template created using Ion Beam Assisted
Deposition. In the second phase, direct deposition of patterned films
as well as the deposition of three dimensional structures will be explored.
The processing effort will be integrally tied to the modeling and simulation
effort described above.
Ion
Beam Assisted Deposition
